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Photolithography

美 [ˌfoʊtoʊlɪ'θɒgrəfɪ]英 [ˌfəʊtəlɪ'θɒgrəfɪ]

n.照相平版印刷术
网络光刻；微影；微影制程

Photolithography

英-汉英-英网络释义

Photolithography

光刻

光刻（英语：photolithography）是半导体器件制造工艺中的一个重要步骤，该步骤利用曝光和显影在光刻胶层上刻画几何图形 …

微影

半导体技术－微影微影（Photolithography）正负光阻微影光蚀刻术起源于照相制版技术。自 1970 年起，才大量使用于半导 …

微影制程

而现有之分子涂布法有微影制程（photolithography）、喷墨列印制程（inkjet printing）、微压印技术(microcontact printing)、 …

光刻法

电器电子专业英语词汇 ... photolithographic resolution 光刻蚀清晰度 photolithography 光刻法 photoluminescence 光致发光 ...

影印

1、影印（Photolithography）在经过热处理得到的硅氧化物层上面涂敷一种光阻（Photoresist）物质，紫外线通过印制着芯片 …

光学微影制程

腕表运用如光学微影制程(photolithography)的尖端技术，还进一步展现了“奇想” 家族的另一发展：一个配备秒钟显示的飞行陀 …

光蚀刻

薄膜电感：利用光蚀刻（photoLithography）技术来将所需图案蚀刻在基板上，由于平面式单层绕线可达到超高稳定度及精密度…

印刷技术

印刷技术（photolithography）与传统的核酸、多肽固相合成技术相结合的产物。

例句：

One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists.

规程的当中一个被使用在做整体集成电路克服这个问题是石版影印根据光致抗蚀剂。

that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring.

测试晶圆片 -影印过程中用于颗粒计算、量溶解度和检测金属污染的晶圆片。

One embodiment of the present invention provides techniques and systems for determining modeling parameters for a photolithography process .

一种用于为光刻工艺确定参数的方法，所述方法包括：接收布局；

Contact-mode photolithography was used for realizing the monolithic integration of 0 .

采用光学接触式光刻方式，实现了单片集成 0 。

Alignment Precision - Displacement of patterns that occurs during the photolithography process .

套准精度 -在光刻工艺中转移图形的精度。

A first photolithography process forms first and second diffusion trench openings for the first and second diffusion regions.

第一光刻工艺为第一和第二扩散区形成了第一和第二扩散沟槽开口。

Methods : Master stamps for soft lithography were produced using photolithography .

方法：主模版采用光刻方法制备，使用硅作为基片。

First , consider the advantages and disadvantages of photolithography.

首先，想想光蚀刻法的优点跟缺点。

The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique.

首先，采用紫外光刻和化学湿法刻蚀技术在玻璃基片上加工微米深度的微通道；

Photolithography : forming electrodes in the form required on the ITO film.

光刻：在 ITO 表面形成要求形状的电极。

Implementation Methods for Amplitude Division Maskless Laser Interference Photolithography

振幅分割无掩模激光干涉光刻的实现方法

Photolithography Process Simulation for Integrated Circuits and Microelectromechanical System Fabrication

集成电路和微电子机械系统加工过程中的光刻工艺模拟

Design and construction of an ultrahigh vacuum evaporation equipment for atom photolithography

原子光刻用超高真空蒸发设备的设计和建立

Application of Semiconductor Photolithography in Biochip Fabrication

半导体光刻技术在生物芯片制作中的应用

Optical proximity correction for improving pattern quality in submicron photolithography

光学邻近校正改善亚微米光刻图形质量

Implementation Methods for Wave -Front Division in Maskless Laser Interference Photolithography

波前分割无掩模激光干涉光刻的实现方法

New Filtering Approach on Partial Coherent Imaging System for Improving Photolithography Resolution

部分相干分数域滤波改善光刻分辨率新方法

Experimental Study on Pupil Filtering Projection Photolithography

光瞳滤波投影光刻实验研究

Improving the edge profiles of lithography patterns using gray-tone technique in digital photolithography

用灰度曝光技术改善数字光刻图形轮廓

Laser Interference Photolithography for Fabricating Periodic Patterns in Large Area

用于大面积周期性图形制造的激光干涉光刻

A Study on Improving Imaging Resolution of Projection Photolithography with Pupil Filtering

光瞳滤波提高投影光刻成像分辨力研究

More complex photolithography operations for deep-submicron designs

深亚微米下的越趋复杂的光刻操作

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