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光刻胶

网络Photoresist; Resist; PHOTORESIST MATERIALS

光刻胶

网络释义

光刻胶

Photoresist

光刻胶(photoresist)又称光致抗蚀剂，即通过紫外光、电子束、离子束、X射线等的照射或辐射，使其溶解度发生变化的耐蚀刻 …

Resist

光刻胶（resist）概述光刻胶是一大类具有光敏化学作用(或对电子能量敏感)的高分子聚合物材料，是转移紫外曝光或电子束曝 …

PHOTORESIST MATERIALS

中国化工论坛... ... ――环氧树脂粘合剂 EPOXY ADHESIVES ――光刻胶 PHOTORESIST MATERIALS ――包封剂 ENCAPSU…

optical resist

电器电子专业英语词汇 ... optical recording head 光记录头 optical resist 光刻胶 optical resonator cavity 光空腔谐振器 ...

PMMA

硬X射线位相衬度成像及荧光全息成像的实验与... ... 4.4.6成像屏 Imaging plate 4.4.7光刻胶 PMMA 4.4.8 电荷耦合器件 CCD ...

RESISTS COATING

湖南普照信息材料有限公司 ... 针孔密度（ PINHOLE DENSITY） 光刻胶（ RESISTS COATING）平面度（ FLATNESS AVAI…

Photo Resists

电路板、电子行业... ... 四氯乙烯(过氯乙烯) Perchloroethylene 光刻胶(光致刻蚀剂) Photo Resists 正面,负面 Positive,Negative ...

例句：

In addition , the distribution of light fields in the photoresist layer is analyzed by finite-difference time-domain method .

另外，本文还利用时域有限差分法分析了光刻胶层内部的光场分布。

Using AZ4620 photoresist throw at plane glass , the measuring thickness of photoresist is benchmark through ellipsometer .

采用 AZ4620 正型光刻胶甩胶于平面玻璃基片，以椭偏仪测量的结果为基准。

It emphaticallydiscusses various dark ultraviolet photoresists which have competitive power in the near future .

着重探讨了近期具有竞争力的各种远紫外光刻胶。

This paper introduces a technical method of etching optical dividing disc with 302~# negative type photoresist .

本文介绍了采用 302 负性光刻胶刻制光学度盘的工艺方法。

taking out the photolithographic glue , make the metal hole or the metal hole array on the underlay.

去掉光刻胶，在衬底上制作成金属孔隙或金属孔隙阵列。

photo-etching adhesive is stripped by acetone to complete the schematization of the bottom electrode ;

用丙酮剥离掉光刻胶完成底电极的图形化；

Stripping of Photoresist by an Atmospheric Pressure Radio -Frequency Plasma

常压射频低温冷等离子体清洗光刻胶研究

stripping off photoresist with acetone to carry out imaging to a bottom electrode ;

用丙酮剥离掉光刻胶对底电极进行图形化；

Sapphire Crystal - Resists scratches better than regular glass

蓝宝石水晶 -光刻胶比普通玻璃划伤更好

Study of Diffractive Field Based Angular Spectrum Theory in Thick Film Photoresist

基于角谱理论的厚层光刻胶衍射光场研究

Preparation and Characterization of Methacrylate Photoresist

甲基丙烯酸酯光刻胶的制备与表征

cyclized polyisoprene rubber negative photoresist ; ultraviolet negative photoresist

环化聚异戊二烯橡胶负性光刻胶

Key technique of photoresist through-mask Electrochemical micromachining

光刻胶掩膜微细电化学加工参数的试验研究

The influence of recording conditions on the signal-to-noise ratio of retrieved images for photoresist Fourier transform holograms

光刻胶傅里叶全息图的记录条件对重构图像信噪比的影响

Measurement of Profile Parameters of Holographic Photoresist Grating Mask Made on Top of Chrome Stack in Spectroscopic Way

镀铬基片全息光栅光刻胶掩模槽形参量光谱检测方法

using thick photoresist as metal graph protection layer in etching time to carry out photo etching for thick metal layers ;

第二步，采用厚的光刻胶作为刻蚀时的金属图形保护层对厚金属层进行光刻；

Synthesis of Cyclized Polybutadiene and Its Application in Photoresists

环化聚丁二烯的合成及其在光刻胶中的应用

Method for Controlling Groove Depth and Duty Cycle of Rectangular Photoresist Gratings

一种控制矩形光刻胶光栅槽深和占宽比的方法

Fabrication Technology of Microlens Array by Melting Photoresist

微透镜阵列的光刻胶热熔制作技术

UV-vis Spectroscopy Study of Resist Film Thickness

紫外可见光谱法测量光刻胶的膜厚

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