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photoresist

美 [ˌfoʊtoʊrɪ'zɪst]英 [fəʊtəʊrɪ'zɪst]

n.【物】光致抗蚀剂
网络光阻；光刻胶；光阻剂

photoresist

英-汉英-英网络释义

photoresist

光阻

1.光阻(photoresist) 2.光罩(mask) 3.对准机(mask aligner)4.曝光光源(exposure source) 5.显像溶液(develope solution) 6.烤箱(he…

光刻胶

光刻胶(photoresist)又称光致抗蚀剂，即通过紫外光、电子束、离子束、X射线等的照射或辐射，使其溶解度发生变化的耐蚀刻 …

光阻剂

光阻剂(photoresist)是电子产业的重要发明，可用於光蚀刻技术(photolithography)，生产积体电路版(Integrated Circuits，即俗 …

光致抗蚀剂

POLYMER - 瑞的日志 - 网易博客 ... 防蚀剂 anti-corrosion agent 光致抗蚀剂 photoresist 防霉剂 antiseptic ...

光阻液

光阻液 (Photoresist)特殊气体监测设备 (GDS) ALD/CVD原物料 LED/太阳能电池(集光型)相关材料抗反射膜 (AR Film) 研磨片 (P…

光阻蚀剂

飞达光学网光电词汇港台地区译法(P) ... photorepeater 复印机 photoresist 光阻蚀剂 photoresist optics exposure 光电导曝光 ...

光阻材料

随着晶体管的临界尺寸越来越小，在芯片光阻材料 (photoresist) 暴露的区域上聚光也越来越难。目前的氩氟 (ArFl) 光刻工具可 …

例句：

When using the sputtering nickel system, photoresist and nickel Crosslinking became extremely easy-to-be strong enough to produce water .

在搁置溅射镀镍的编制洋，平刻胶与镍交联后变得格外坚硬，极易爆发水纹。

A small undesired hole in an oxide , opaque region of a mask or reticle , or in a photoresist layer .

氧化物、掩模或标线的不透明区域，或光刻层中不需要的小孔。

Comparing with all the existing sacrificial layer materials, the photoresist being used as sacrificial layers has some advantages .

同现有的牺牲层材料相比，光致抗蚀剂作牺牲层材料具有一些优越性。

Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing .

本发明的涂料组合物可用作光致抗蚀剂的覆盖涂层，包括可用在浸渍平版印刷工艺中。

Otherwise, using photoresist as sacrificial layers does not restrict the thickness of structures and the choice of materials .

此外，用光致抗蚀剂作牺牲材料不影响结构的厚度和材料的选择。

A new method with a one wavelength laser for making 3D diffusion objects true color rainbow hologram on the photoresist plate is presented .

提出了一种用单波长激光制作真彩色彩虹全息图的新方法。

aqueous solution as the developer the photoresist can be of negative tone .

用氢氧化钠 -乙醇水溶液显影可以得到负性光刻图形；

Positive Photoresist is rubber particles upward, the same height and diameter of the rubber .

正胶就是胶皮颗粒向上、高度与直径相等的胶皮。

In addition , the distribution of light fields in the photoresist layer is analyzed by finite-difference time-domain method .

另外，本文还利用时域有限差分法分析了光刻胶层内部的光场分布。

Using AZ4620 photoresist throw at plane glass , the measuring thickness of photoresist is benchmark through ellipsometer .

采用 AZ4620 正型光刻胶甩胶于平面玻璃基片，以椭偏仪测量的结果为基准。

A photoresist pattern can be formed on the dielectric.

在该电介质上形成光致抗蚀剂图案；

This paper introduces a technical method of etching optical dividing disc with 302~# negative type photoresist .

本文介绍了采用 302 负性光刻胶刻制光学度盘的工艺方法。

Study on Process of Water-soluble Printing Photoresist.

水性印花感光制版材料的研究。

R . 177 so that it can be used for modulation the photoresist .

177 进行分散及稳定处理，使其能够适用于光阻剂的调制。

Preparation of Antifoaming Agent Used for Developing Semi-Aqueous Dry Film Photoresist

印制线路板显影液用消泡剂的研制

Stripping of Photoresist by an Atmospheric Pressure Radio -Frequency Plasma

常压射频低温冷等离子体清洗光刻胶研究

Acid Proliferation Generator and Its Application in Chemically Amplified Photoresist

酸增殖源及其在化学增幅抗蚀剂体系中的应用

stripping off photoresist with acetone to carry out imaging to a bottom electrode ;

用丙酮剥离掉光刻胶对底电极进行图形化；

Calculating the Contrast and Threshold Sensitivity of a Positive Photoresist

计算正性光致抗蚀剂的对比度和阈限灵敏度

forming a hard mask layer and a patterned photoresist layer on the semiconductor substrate;

图案化该光致抗蚀剂层以形成一第一开口；

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